Sputter coating of SEM samples is the process of coating ultrathin electrically conductive thin films of noble metals like Gold, Gold- Palladium, Platinum, Silver on non-conductive (insulating) specimens. Electrically conductive specimen interact better with the electron beam of the SEM which gives clear image. However non-conductive specimen build up electro static charge from the electron beam of the SEM and therefore interferes with the signal used to create the SEM image. Sputter coating thin films of conductive materials on non-conductive specimens prevents electro-static charge build up over such specimen. It also increases the amount of secondary electrons generated from the specimen surface detected by the SEM which increases the signal to noise ratio resulting in better imaging. Sputtered films for SEM typically range in 2-20nm thickness. Carbon Coating is used in sample preparation for subsequent observation under scanning electron microscope (SEM), Transmission electron microscope (TEM), and X- Ray analysis (EDX). This is because carbon has a low atomic number and the peak of the X-ray graph of carbon doesn’t interfere with peaks of other elements. Carbon film evaporated with carbon fiber or carbon rod is deposited on the sample. Carbon evaporates from the fiber or rod as a result of electric current passing through them and is deposited on the sample. Suitable thicknesses for sample preparation for electron microscopy are between 5 and 20 nm.
Carbon Evaporation Mount: Carbon rod having diameter 6.15mm can be evaporated in pulse mode. Carbon Thread/ Fiber can be evaporated in flash mode. Either of carbon rod or carbon thread/ fiber can be used at one time. Sharpener for shaping carbon rods is included
Carbon Evaporation Power Supply: 0-10 volts, 120A power supply is provided for carbon rod or carbon thread/ fiber evaporation. Carbon evaporation power supply has overcurrent protection
Cabinet & controller: control will be conveniently located in one single table top cabinet with necessary safety Interlocks for ‘User Friendly’ operation
PLC with 7” touch screen HMI to enable selection of Manual or Automatic operation
Chamber: Quartz Glass Chamber 180 mm diameter x 180 mm height having Viton Gasket sealing and hinged top flange for loading and unloading of specimen and exchange of targets. Stainless Steel 304L Chamber can be offered optionally instead of glass chamber
One fine controlled needle valve for Argon gas inlet
Sputter Pressure Control between 0.1 mbar to 0.5 mbar
Timer: Digital timer to set the coating time from 5 seconds to 300 seconds
Specimen Holder Stages: Basic specimen stage to hold max 12 SEM stubs of 12.5 mm diameter or 6 SEM stubs of 16mm diameter.
Specimen holder to target distance can be varied between 20mm to 60mm (40mm range adjustment).
Specimen holder rotation up to 20 RPM or Rotary planetary stage can be offered optionally.
Pumping System: 8 m3/hr rotary pump with oil mist filter, suitable to get ultimate vacuum better than 2 x 10-2 mbar.
Dry scroll pump is optionally available.
Quartz Crystal Monitor: Quartz crystal film thickness monitor for in-situ coating thickness measurement is optionally available
Vacuum gauge: Pirani gauge to measure from atmosphere up to 1x10-3 mbar is provided
230VAC, 50 Hz
L 630mm x W 650mm x H 650mm
SNCC-180R: Rotary pump version of sputter and carbon coater capable of reaching ultimate vacuum in 10^-3 mbar range
SNCC-180T: Turbo pump version of sputter and carbon coater capable of reaching ultimate vacuum of 5x10-5 mbar


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