Sputter coating of SEM samples is the process of coating ultrathin electrically conductive thin films of noble metals like Gold, Gold- Palladium, Platinum, Silver on non-conductive (insulating) specimens. Electrically conductive specimen interact better with the electron beam of the SEM which gives clear image. However non-conductive specimen build up electro static charge from the electron beam of the SEM and therefore interferes with the signal used to create the SEM image. Sputter coating thin films of conductive materials on non- conductive specimens prevents electro-static charge build up over such specimen. It also increases the amount of secondary electrons generated from the specimen surface detected by the SEM which increases the signal to noise ratio resulting in better imaging. Sputtered films for SEM typically range in 2-20nm thickness. Carbon Coating is used in sample preparation for subsequent observation under scanning electron microscope (SEM), Transmission electron microscope (TEM), and X- Ray analysis (EDX). This is because carbon has a low atomic number and the peak of the X- ray graph of carbon doesn’t interfere with peaks of other elements. Carbon film evaporated with carbon fi ber or carbon rod is deposited on the sample. Carbon evaporates from the fiber or rod as a result of electric current passing through them and is deposited on the sample. Suitable thicknesses for sample preparation for electron microscopy are between 5 and 20 nm.
Magnetron Sputter Source: One 57mm diameter Magnetron Sputter source for sputtering of thin films of required noble metal targets such as gold, platinum, gold- palladium, silver etc.
Magnetron capable of handling 57 mm diameter targets. The standard thickness of targets to be sputtered is 0.1mm up to 0.2mm
Sputter Power Supply: Low Voltage power supply to enable current control within 5 mA to 80 mA resulting in controlled deposition of conductive materials such as gold, platinum, gold-palladium, silver etc. Sputter power supply has in-built arc suppression circuitry and overcurrent protection.
Carbon Evaporation Mount: Carbon rod having diameter 6.15mm can be evaporated in pulse mode. Carbon Thread/ Fiber can be evaporated in flash mode. Either of carbon rod or carbon thread/ fiber can be used at one time. Sharpener for shaping carbon rods is included
Carbon Evaporation Power Supply: 0-10 volts, 120A power supply is provided for carbon rod or carbon thread/ fiber evaporation. Carbon evaporation power supply has overcurrent protection
Cabinet & controller: Control is located in one single table top cabinet with necessary safety Interlocks for ‘User Friendly’ operation
PLC with 7” touch screen HMI to enable selection of Manual or Automatic operation
230VAC, 50 Hz
L 630mm x W 650mm x H 650mm
SNCC-180R: Rotary pump version of sputter and carbon coater capable of reaching ultimate vacuum in 10^⁻³ mbar range
SNCC-180T: Turbo pump version of sputter and carbon coater capable of reaching ultimate vacuum of 5x10⁻⁵ mbar


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