Microklean Plasma Asher
μK 180R
- Chamber incorporates two TEM holder ports
- Front view port for visualization of plasma process
- Incorporates Remote Downstream Plasma Source RPS-40
- Oxygen radicals from plasma clean hydrocarbon contamination
- Significantly reduced Ion bombardment on the specimen
- MFC’s for Argon, Oxygen & optionally Hydrogen gas
- Adjustable RF power up to 100W @ 13.56MHz
- Manual impedance matching network
- Ultimate vacuum < 5 x 10⁻² mbar (High Vacuum version optionally available )
- Manual or automatic sequential operation
• Applications include:
➢Cleaning of H-C contamination from TEM specimen & holders
➢Surface activation of carbon coated copper grids
Carbon contamination on FIB sample before plasma cleaning
Carbon contamination removed from FIB sample after plasma cleaning
Fingerprint on SEM sample before plasma cleaning
Fingerprint removed from SEM sample after plasma cleaning
Hydrophobic Surface of carbon coated copper grid before plasma activation
Hydrophilic Surface of carbon coated copper grid after plasma activation (wettability improved)
Power Requirements
230 VAC, 50 Hz /
120 VAC, 60 Hz
Dimensions
L 610mm x W 525mm x H 520mm